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Raith e_Line-System - Specifications

Lithography

  • schottky field emission electron source
  • Gemini® electron column from the Supra™-Series of Zeiss with 100 eV up to 30 keV
  • 20 MHz pattern generator
  • writing field from 500 nm up to 2 mm, max. 16 Bit × 16 Bit addressable
  • laser interferometric stage with 100 mm × 100 mm travel distance,
    position accuracy of 2 nm
  • beam diameter ≤ 4 nm @ 1 kV, ≤ 2 nm @ 20 kV
  • stitching and overlay accuracy ≤ 60 nm
  • automatic height measurement

Microscope

  • two secondary electron detectors, one as "in-lens"
  • maximum magnification 1 000 000 times
  • maximum image size 3072 × 2304 pixel

EDS

  • "QuanTax"-system from Bruker
  • LN2-free detector "XFlash® 3001"

 

Further information about the electron beam lithography system e_Line can be found on the homepage of the Raith company.

Information about the electron optic can be found on the homepage of the Zeiss company.