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Advanced Resist Processing System "EVG 101"

  • semi-automatic spin coating of samples up to 100 mm diameter
  • semi-automatic spray coating of pieces and wafer up to 100 mm diameter
  • conformal layers of photoresist or polymers are achieved on 3D structured wafers
  • syringe dispense system for utilization of small resist volumens, including high viscosity resists (i.e. BCB), with two spray nozzles

Co-financed by Fraunhofer Institut für Physikalische Messtechnik (FhG-IPM), Terahertz-Messtechnik und Systeme