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Cross section polisher “Hitachi Ion Milling System E-3500“

  • Argon ion beam polisher
  • For polishing of edges of samples for scanning electron microscopy
  • Acceleration voltage: 0 – 6 kV
  • Ion beam: 0 – 999 µA
  • Beam Diameter: 400 µm
  • Maximum etching rate in Si: 100 µm/h
  • Maximum sample size: 20 mm x 12 mm x 5 mm