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Oxidation Furnace "AVT PEO 603"

Two types of processes for thermal oxidation of silicon can be distinguished: dry and wet oxidation. During the dry oxidation process Si-wafer are heated and moisture-free oxygen is streaming through the oven. Compared to wet oxidation the oxide obtained in dry oxidation is more dense but grows much slower. In a wet oxidation process water in the form of vapor is used as a carrier for the oxygen gas.

Process temperatures are up to 1100°C.