FEI Helios Nanolab 650
Dualbeam system FIB/REM
The dualbeam system is a combination of an electron and an ion beam column. It can be used for sample ananlysis by electron beam or ion beam microscopy as well as electron beam lithography and focussed ion beam (FIB) milling. Lithography and milling can both be controlled by a Raith multibeam system.