Nano Structuring Center

Equipment Photolithography

Mask Aligner "EVG 620" Double Side Aligner

Photolithography is a technique where a photosensitive film (resist) is exposed through a mask. The mask, e.g. is a quartz substrate coated with a structured chromium layer. The resolution of the contact exposure used here is 2 µm.

Spin Coater "Süss Delta 80BM Gyrset"

The sample is coated with a liquid resist. Spin coating generates a thin, homogenous film. The Gyrset (closed bowl spinning) keeps the sample in a saturated solvent atmosphere. This reduces the so called edge bead and allows for a more homogenous coating of irregular pieces.


The HMDS oven is used for depositing the resist adhesion promoter hexamethyldisilazan (HMDS) onto the surface of the substrate.

Spin Coater

Read more


Read more
Go to top