Advanced Resist Processing System "EVG 101"
- semi-automatic spin coating of samples up to 100 mm diameter
- semi-automatic spray coating of pieces and wafer up to 100 mm diameter
- conformal layers of photoresist or polymers are achieved on 3D structured wafers
- syringe dispense system for utilization of small resist volumens, including high viscosity resists (i.e. BCB), with two spray nozzles
Co-financed by Fraunhofer Institut für Physikalische Messtechnik (FhG-IPM), Terahertz-Messtechnik und Systeme