Cross section polisher “Hitachi Ion Milling System E-3500“
- Argon ion beam polisher
- For polishing of edges of samples for scanning electron microscopy
- Acceleration voltage: 0 – 6 kV
- Ion beam: 0 – 999 µA
- Beam Diameter: 400 µm
- Maximum etching rate in Si: 100 µm/h
- Maximum sample size: 20 mm x 12 mm x 5 mm