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Nano Structuring Center NSC

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HMDS-Oven (built in-house)

A commonly known problem in photolithography on Siliconoxide (SiO2 or glass) and Silicon (Si) surfaces is poor adhesion of the photoresist. Therefore, an adhesion promotor is applied.

A popular adhesion promotor used by the semiconductor industry is Hexa­methyl­di­silazane (HMDS). Compared to other adhasion promotors HMDS not only reacts with water but also with silanol groups at the SiO2 or Si surface, respectively.

In the HMDS oven the adhesion promotor is deposited onto the substrate surface in the gase phase at 120°C. Alternatively, liquid HMDS can be spin coated onto the substrate.