Raith e_Line-System - Specifications
Lithography
- schottky field emission electron source
- Gemini® electron column from the Supra™-Series of Zeiss with 100 eV up to 30 keV
- 20 MHz pattern generator
- writing field from 500 nm up to 2 mm, max. 16 Bit × 16 Bit addressable
- laser interferometric stage with 100 mm × 100 mm travel distance,
position accuracy of 2 nm - beam diameter ≤ 4 nm @ 1 kV, ≤ 2 nm @ 20 kV
- stitching and overlay accuracy ≤ 60 nm
- automatic height measurement
Microscope
- two secondary electron detectors, one as "in-lens"
- maximum magnification 1 000 000 times
- maximum image size 3072 × 2304 pixel
EDS
- "QuanTax"-system from Bruker
- LN2-free detector "XFlash® 3001"
Further information about the electron beam lithography system e_Line can be found on the homepage of the Raith company.
Information about the electron optic can be found on the homepage of the Zeiss company.